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Scientists develop an ultra-fast 2D semiconductor growth process
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Scientists develop an ultra-fast 2D semiconductor growth process

  • Chinese researchers report a wafer-scale growth method for 2D tungsten silicon nitride that is about 1,000x faster than usual techniques.
  • The new method increased film production speed about 1,000 times over conventional approaches.
  • The substrate uses a liquid gold and tungsten bilayer to enable growth of the films.
  • The films reached dimensions about 1.4 by 0.7 inches, signaling progress toward scalable manufacturing.
  • Moore's Law remains challenged as transistor miniaturization hits quantum and heat limits.
  • 2D semiconductors are seen as key candidates for post-Moore devices despite production challenges.
  • Developers caution that cost and scalability remain major obstacles for commercial deployment.
  • Researchers aim for tunable doping properties in the 2D films.
  • The study contributes to the broader effort to extend chip performance beyond silicon.
  • Industry experts recognize the novelty but emphasize the road to mass production.
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